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  208HRThe high-resolution ion sputtering instrument provides a true solution to various sample sputtering problems encountered in field emission scanning electron microscopy applications.

  When observed by field emission scanning electron microscopy, the sample needs to be coated with an extremely thin, amorphous, and uniform film layer to eliminate charge accumulation and improve the contrast of low-density materials. In order to minimize the size of fine crystals,208HRProvides a range of coating materials and unparalleled control over film thickness and sputtering conditions.

  208HRThe molecular turbo pump high vacuum system provides a wide range of operating pressures, allowing for precise control of membrane uniformity and consistency, while minimizing charging effects to the greatest extent possible. tall/The structural design of the low sample chamber makes it extremely convenient to adjust the distance between the target material and the sample.

  MTM-20The resolution of the high-resolution film thickness controller is less than0.1nmIts function is to precisely control the thickness of the plated film, and it is particularly suitable for field emission electron microscopy to measure the film thickness（0.5－3nm）The requirements.

  The recommended target materials for field emission scanning electron microscopy coating are:

  • Pt/PdUniversal coating materials for non-conductive sample coating

  • CrExcellent coating materials for semiconductor samples

  • IrExcellent truly amorphous coating material

  208HRThe system provides multiple configuration options to achieve the best high-resolution coating effect, which can be equipped with standard rotary vane pumps or oil-free vortex vacuum pumps that provide clean vacuum208HRcontainCrandPt/PdTarget.

  1、 Main characteristics

  · Multiple coating materials can be selected

  · Accurate film thickness control

  · Flexible control of sample stage:It can independently rotate, planetary rotate, and tilt control the sample stage to ensure that samples with large morphological differences can also achieve the best coating effect.

  · Multiple sample holders:provide4Each sample holder has a diameter of32mm, can load up to6A small sample holder.

  · Variable geometry of sample chamber: Sample chamber geometry is used to adjust the coating rate（1.0nm/s～0.002nm/s）

  · Wide range of operating pressureIndependent power and pressure regulation, the pressure range of argon gas is0.2 - 0.005 mbar.

  · Compact and modern tabletop design

  · easy operation

  2、 Technical parameters

  Sputtering System
  Coating head	Low voltage planar magnetron Rapid replacement of target material Surrounding dark area shield Target material adjustment and shielding
  Target material	Cr, Pt/Pd (standard configuration) Ta, Au, Au/Pd, Pt, W, Ir , Ti(Optional)
  Coating control	microprocessor control SAFETY INTERLOCK Current control is independent of vacuum degree Digital selectable current（20，40，60 and80mA）
  Sample Room Size	diameter150mm Height165 - 250mm
  sample stage	Non repetitive rotation, planetary rotation, and manual tilting capability0-90° Adjustable rotational speed Crystal head 4A sample table
  Analog metrology	vacuumAtm - .001mb electric current0-100mA
  Control method	Automatic gas purification and venting function Automatically process sorting Digital timer with 'pause' function Automatic bleeding
  Film thickness control	MTM-20High resolution film thickness controller
  vacuum system
  structure	Combination of molecular turbine traction pump and rotary vane pump, Oil free vortex vacuum pump instead of rotary vane pump (optional)
  Vacuum pumping speed	0.1mbbelow300 l/min
  time for vacuum	1 mbarto1 x 10-3mbar
  mbar	1 x 10-5mbar
  Desktop system	The rotary vane pump is placed on an anti-seismic platform and is equipped with a fully metal vacuum coupling system
  Film thickness measurement and control instrument
  MTM-20	Based on microprocessors,4Digital display, reset button,6MHzCrystal (with lifespan check function),5order/sThe update rate
  Film thickness range	0.0 - 999.9nm
  resolution	be better than0.1nm
  Density range	0.50 - 30.00gm/cm3
  Correction coefficient range	0.25 - 8.00
  Termination range of coating	Film thickness0 - 999.9nm
  system requirements
  electrical	100-120perhaps200-240VAC, 50/60Hz
  power	550VA(Maximum)
  argon	minimum purity99.995% Adjust pressure5 - 6 psi (0.4 bar) 6.0mm IDHose