Bottled mineral water equipment-Fornitore globale

Rooms 1501-1522, Building B, Wanda Plaza, Intersection of Zhongyuan Road and Qinling Road, Zhengzhou City

According to the water demand of users; The project plan is to configure a fully automatic new intelligent dual stage reverse osmosis ultrafiltration water treatment unit to meet the water demand of users; The equipment is fixed with a 304 stainless steel frame, which is compact in structure and convenient for transportation, maintenance, installation, and commissioning; The entire pressure vessel and pipe valve pump of the machine are made of 304 stainless steel sanitary grade material and products from well-known brands in the industry, with a longer service life and higher sanitary standards; The water production process of the equipment adopts our company's latest patented technology, with high automation, small footprint, longer lifespan of the filtration system, and easier maintenance and replacement; All modular production and manufacturing make it easier and more convenient to repair or replace parts and consumables in case of malfunction.

Introduction to Pure Water Equipment Process for Electronic Semiconductor Industry：
Raw water → Raw water booster pump → Multi medium filter → Activated carbon filter → Dosing device → Precision filter → High pressure pump → Ultrafiltration unit → Purified water tank

Henan Wanda Environmental Protection Electronic Semiconductor Industry Pure Water Equipment Product Features:
1. Continuous operation produces stable water quality for better quality.
2. The system operates reliably and stably.
3. Low operating costs.
4. Small footprint.
5. High degree of automation.
6. Simple operation and maintenance, no need to come into contact with acid or alkali.
7. Safe use and good environment.
8. No sewage discharge, no environmental pollution.

Henan Wanda Environmental Protection Electronic Semiconductor Industry Pure Water Equipment Product Parameters：
1. Conductivity: 2-10 μ S/cm (25 ℃)
2. PH value: 6.5-9
3. Water temperature: 5-35 ℃
4. Total hardness:< 0.5ppm
5. Organic compounds:< 0.5 ppm, TOC is zero
6. Oxide: ≤ 0.05ppm
7. Iron and manganese:< 0.01ppm
8. Silicon dioxide:< 0.05 ppm
9. Carbon dioxide:< 5ppm