Solar perovskite cell laser etching machine, using femtosecond laser etching equipment suitable for ITO FTO、 Laser etching of conductive metals and oxide materials such as zinc oxide, zirconium oxide, titanium oxide, nickel oxide NiOx, gold, silver, carbon powder, copper, aluminum, etc. It can also be used for ultra fine line wide laser etching, marking, and grooving of materials such as glass, silicon wafers, and zirconia ceramics.
At the same time, it is suitable for ultra fine wire wide laser etching processing of other multi-layer materials, such as PI film etching on stainless steel mesh, PI film etching on glass substrate, stainless steel grating marking and other applications.
Equipment Introduction
The equipment adopts a solid-state laser with a wavelength of 1030nm, suitable for fine marking of conductive glass and coatings; Using independently developed control software and directly importing CAD data for laser etching, the operation is simple, convenient and fast; By adjusting the design of the vibrating mirror, linear motor, and electric lifting worktable in real-time through software, coupled with the vacuum adsorption tray device, the smoothness of the laser etching machine during processing operation can be effectively solved; Adopting a unique dust removal system design, it can ensure the cleanliness of the glass and the working surface, and ensure no residue during the laser etching process.
The equipment integrates advanced manufacturing technologies such as CNC technology, laser technology, software technology, etc., and has the characteristics of high flexibility, high precision, and high speed. It can perform precise and high-speed etching of various patterns and sizes on a large scale, and can ensure high production capacity. It is a reliable, stable, and high-performance cost-effective product.
Applications
Laser etching of coatings on substrates such as glass, silicon wafers, ceramics, PET films, etc. is commonly used in industries such as touch screens, photovoltaic solar cells, electrochromic glass, dimming glass, luminescent glass, and other display screens.
Overall description
Main components: laser, optical path system, motion system, control system Positioning system Dust extraction system The true adsorption air system and other components.
Main technical parameters
model |
ET1260-FFPerovskite cell laser etching machine |
|
laser device |
Femtosecond and picosecond lasers with wavelengths of 1030nm/532nm |
Nanosecond laser, wavelength 1064nm |
Processing format |
1200*600mm/600*500mm/500*400mm(Customizable processing format) |
|
focusing spot |
<10μm |
<20μm |
Laser frequency adjustment range |
20-5000KHz |
100-500KHz |
Etching minimum line width |
<10 um |
<20μm |
(Up to 95% of oxide coatings can be removed) | ||
Precision of the whole machine |
±15μm |
±20μm |
Minimum line spacing |
<10μm |
<20μm |
Workbench positioning accuracy |
±2um |
|
Workbench repeatability accuracy |
±1um |
|
CCDAutomatic positioning accuracy |
±2um |
|
etching rate |
<4000mm/s |
|
Equipment size |
1950mmL×1700mmW×1960mmH(Depending on actual size) |
|
Equipment weight |
3500kg |
|
Power consumption |
<3000W |
|
Capable of handling file formats |
Standard CAD2004 version DXF file |
Note: According to the needs of the experimental stage in the early stage of the laboratory, Wuhan Yuanlu Optoelectronics has developed a small laser etching machine for the laboratory stage, which is suitable for laser etching and marking applications of conductive glass below 100 * 100mm. Welcome to consult and learn more.