The NSC IC opening witness PL201 laser chemical opening machine is equipped with a fiber laser. Compared with traditional solid-state lasers, the laser/chemical opening machine has lower direct costs and longer service life.

From passivation to interlayer film

The gas flow rate, vacuum conditions, and RF matching are automatically controlled by the system.The system is easy to operate, just select the recipe and press the start button to start etching.

The RF generator, vacuum control system, and temperature control unit have been upgraded to improve etching stability and repeatability.

ES403 can etch up to 8-inch wafers and small devices such as IC packs that use optional adapters.ES403 provides stable and efficient etching, and its high-performance vacuum system is controlled by a turbo molecular pump, mass flow controller, and butterfly valve.