The VIL series nano pattern system (laser interference lithography machine) has powerful functions such as fast and reconfigurable beam transmission, active pattern stability, and precise sample positioning. This system can be achieved through the use of standards2cm×2cmRepeated exposure of pattern fields with square or user-defined shapes, in8Generate various nanostructures on a large area of inches, such as1DGrating lines and2Dcolumn/Hole pattern, period from240 nmarrive1500 nm.