For engineers, identifying media/The task of nanoscale defects on planar substrates is a very time-consuming process,Park NX-HDMAtomic force microscopy systems can automatically identify defects and improve defect detection efficiency by being combined with various optical instruments. More and more industries require ultraflat media and substrates to meet the constantly shrinking equipment demands,Park NX-HDMAtomic force microscope system has the lowest performance in the industry0.5Combining with its true non-contact mode to achieve sub angstrom level surface roughness testing.
Basic technical parameters
200 mmelectricXYplatform |
electricZplatform |
noise |
The itinerary can be reached150mm x 150mm, 2 μmreproducibility0.095nmresolution |
25 mm ZTravel distance 0.1μmResolution less than1μmreproducibility |
Less than0.5 μm/s
|
size&weight |
control box |
Equipment demand environment |
880(w)x 880(d)x 880(h) 620kg |
600(w)x 900(d)x 1330(h) 170kg |
room temperature10 ℃~40℃ operate18 ℃~24℃ humidity30%~60% |
major function
1)Quick automatic defect detection function
2)Measurement of sub angstrom surface roughness
3)Minimize thermal drift and automatically analyze measured data
4)Online monitoring and testing process,
application
Automatic defect detection
Related literature
Foucher; R Therese; Y. Lee; S.-I.