Shanghai Nateng Instrument Co., Ltd
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NX-HDM fully automatic defect detection atomic force microscope
NX-HDM fully automatic defect detection atomic force microscope
Product details

For engineers, identifying media/The task of nanoscale defects on planar substrates is a very time-consuming process,Park NX-HDMAtomic force microscopy systems can automatically identify defects and improve defect detection efficiency by being combined with various optical instruments. More and more industries require ultraflat media and substrates to meet the constantly shrinking equipment demands,Park NX-HDMAtomic force microscope system has the lowest performance in the industry0.5Combining with its true non-contact mode to achieve sub angstrom level surface roughness testing.



Basic technical parameters


200 mmelectricXYplatform

electricZplatform

noise

The itinerary can be reached150mm x 150mm,

2 μmreproducibility0.095nmresolution

25 mm ZTravel distance

0.1μmResolution less than1μmreproducibility

Less than0.5 μm/s

size&weight

control box

Equipment demand environment

880wx 880dx 880h

620kg

600wx 900dx 1330h

170kg

room temperature10 ~40

operate18 ~24

humidity30%~60%


major function

1)Quick automatic defect detection function

2)Measurement of sub angstrom surface roughness

3)Minimize thermal drift and automatically analyze measured data

4)Online monitoring and testing process,


application

Automatic defect detection



Related literature

Foucher; R Therese; Y. Lee; S.-I.

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