Shanghai Nateng Instrument Co., Ltd
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P17 automatic wafer probe profilometer/stair step meter
P17 automatic wafer probe profilometer/stair step meter
Product details

P-17 is the eighth generation desktop probe profiler, which is the culmination of over 40 years of surface measurement experience. This system is industry-leading and supports 2D and 3D measurements of step height, roughness, curvature, and stress. Its scanning can reach up to 200mm without the need for image stitching.

This system combines UltraLite ® Sensors, constant force control, and ultra flat scanning platform provide excellent measurement stability. The program settings are simple and fast through functions such as point and click platform control, top and side view optical systems, and high-resolution cameras with optical zoom. P-17 is equipped with various filters, leveling, and analysis algorithms for quantifying surface morphology, and can support 2D or 3D measurements. And achieve fully automatic measurement through pattern recognition, sorting, and feature detection.




2、 Function

Equipment features

Step height: several nanometers to 1000 μ m

Micro force constant force control: 0.03 to 50mg

Sample full diameter scanning, no need for image stitching

Video: 5-megapixel high-resolution color camera

Arc correction: Eliminating errors caused by the arc-shaped motion of the probe

Software: Simple and easy-to-use software interface

Production capacity: Fully automated through sequencing, pattern recognition, and SECS/GEM

Main applications

Step height: 2D and 3D step height

Texture: 2D and 3D roughness and waviness

Shape: 2D and 3D warping and shaping

Stress: 2D and 3D thin film stress

Defect re inspection: 2D and 3D defect surface morphology

Industrial applications

Semiconductors and compound semiconductors

LED: Light Emitting Diode

solar energy

MEMS: Micro Electro Mechanical Systems

Data Storage

car

medical equipment

3、 Application Cases

step height

P-17 can provide measurements of 2D and 3D step heights ranging from nanoscale to 1000 μ m. This enables quantification in etching, sputtering, SIMS, Materials deposited or removed during deposition, spin coating, CMP, and other processes. P-17 has constant force control function, which can dynamically adjust and apply the same micro force regardless of the step height. This ensures good measurement stability and the ability to accurately measure soft materials such as photoresist.


Texture: roughness and waviness

P-17 provides 2D and 3D texture measurement and quantification of sample roughness and waviness. The software filter function divides the measured values into roughness and waviness parts, and calculates parameters such as root mean square (RMS) roughness.

Appearance: Warping and Shape

P-17 can measure the 2D shape or curvature of the surface. This includes measuring wafer warpage, such as during multi-layer deposition in semiconductor or compound semiconductor device production, where layer to layer mismatch is the cause of this warpage. P-17 can also quantify the structural height and curvature radius, including the lens.

Stress: 2D and 3D thin film stress

P-17 is capable of measuring the stress generated during the production of semiconductor or compound semiconductor devices containing multiple process layers. Use a stress chuck to support the sample in a neutral position and accurately measure the sample warpage. Then, by applying the Stoney equation, stress can be calculated using shape changes such as thin film deposition processes. 2D stress is measured through a single scan on a sample with a diameter of up to 200mm, without the need for image stitching. The measurement of 3D stress adopts multiple 2D scans and combines the rotation of the θ platform between scans to measure the entire sample surface.

Defect re inspection

Defect review is used to measure the morphology of defects such as scratch depth. Defect detection equipment identifies defects and writes their location coordinates into KLARF files. The 'Defect Re inspection' function reads KLARF files, aligns samples, and allows users to select defects for 2D or 3D measurement.


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