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Maximum compatible square substrate size: 8 × 8 inch substratePurpose: Can be used for removing surface contaminants from mask plates.
Cleaning method: The mask plate is driven by a motor through a clamping mechanism to perform centrifugal rotation.
Cooperate with atmospheric water cleaning
High pressure water cleaning
Megasonic cleaning
Brush cleaning
Organic solvent cleaning and other methodsroleThe removal rate of particles larger than 0.5 microns is close to 100%.
Even smaller particle removal rateTechnical specifications can be provided according to customer requirements.
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